Chongqing Silian Optoelectronic Science & Technology Co., Ltd.

Chongqing Silian Optoelectronic Science & Technology Co., Ltd.

Manufacturer from China
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No Cracking 6 Inch Sapphire Wafer With Good Light Transmittance

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Chongqing Silian Optoelectronic Science & Technology Co., Ltd.
City:chongqing
Province/State:chongqing
Country/Region:china
Contact Person:MsWu
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No Cracking 6 Inch Sapphire Wafer With Good Light Transmittance

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Brand Name :Silian
Model Number :Customized
Certification :SGS/ ISO
Place of Origin :Chongqing,China
MOQ :500pcs
Price :Negotiable
Payment Terms :Western Union, T/T, MoneyGram
Supply Ability :20,000 pcs/month
Delivery Time :5-8 weeks
Packaging Details :1pcs/12pcs/25 pcs
Diameter :150.1±0.1
Flat Length :47.5±1
Bow :0 ~ (-10) um
Color :Transparent; other colors
Material :High Purity and Monocrystalline AL2O3
Surface Crystal Orientation :C-Plane 0°±0.1°
Primary Flat Orientation :A-plane 0°±0.5°
Broke Edge :≤3mm
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6-inch sapphire substrate with good light transmittance

Product Description

The chemical composition of sapphire crystal is alumina, with the crystal structure hexagonal lattice. Sapphire is a commonly used substrate material for gallium nitride (GaN) epitaxial growth. It has ultra-high hardness, stable physical and chemical properties at high temperatures, excellent optical performance.

Technical Specification

Properties Unit 6 inch substrate
Diameter mm 150.1±0.1
Flat Length mm 47.5±1
Material High Purity and Monocrystalline AL2O3
Surface Crystal Orientation C-Plane 0°±0.1°
Primary Flat Orientation A-plane 0°±0.5°
Broke Edge ≤3mm
Crack No Cracking
Defect No Wrappage,Twin Crystal or Crystal Boundary
EPD <1000/cm²

Performance research

The semi-polar and non-polar GaN can be grown on the sapphire substrate with some special planes like M-plane <1-100>and R-plane <1-102>. The semi-polar and non-polar GaN have good performance to improve the device droop effect, wavelength shift phenomenon and long wavelength band efficiency of LED device. Studies have shown that using the high-temperature AlN nucleation layer and the higher AlGaN growth temperature, or a buffer layer with the multilayer AlGaN, or using Si doping technique can effectively improve the crystal quality and the dislocation density of semi-polar and non-polar AlGaN thin films grown on sapphire substrates.

No Cracking 6 Inch Sapphire Wafer With Good Light Transmittance

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